Chemical Stability of Sputter Deposited Silver Thin Films
نویسندگان
چکیده
Silver films with a thickness below 50 nanometer were deposited on glass using DC magnetron sputtering. The chemical stability of the was investigated by exposure film to droplet HCl solution in humid atmosphere. affected area monitored digital microscope. increases approximately linearly time which points diffusive mechanism. slope versus plot, or diffusivity, measured as function acid concentration, presence an aluminum seed layer, and thickness. diffusivity scales concentration. It is shown that for Al-seeded Ag much lower. behavior more complex it shows maximum.
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ژورنال
عنوان ژورنال: Coatings
سال: 2022
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings12121915